ࡱ> 8:7_ Rbjbj25\5\xx8G S P!l_____  $"r%6 9 __H !???*__ ? ???_eH(?  !0P!?%F%??%; \? ?P!%xI : 06g2e0] zyf[MRl[W,{122Rb'Y['Yeu'Yf[N[^^vTime-of-Flight Secondary Ion Mass Spectrometry and Its Applications in Materials Sciences;NNBR`R xvzXT^e2015t^6g2efgN NHS9:00^0WpV[ATё] z-N_O[A:S~T['Y|i319 ^Q[Time-of-flight secondary ion mass spectrometry (ToF-SIMS) is a surface-sensitive analytical technique used to identify elements and molecules. It probes the topmost 1-3 nm of a surface by measuring the (secondary) ions generated by bombarding the surface with a pulsed (primary) ion beam. With another sputter ion beam to remove a controllable amount of substance, ToF-SIMS is also a unique technique to probe chemical information in depth with a depth resolution of~1nm. 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